To meet increasing sensitivity to semiconductor manufacturing contaminants, wafer cleaning has become one of the most critical operations. Minimized particle contamination from process equipment is of paramount importance to obtain a high yield.
In comparison to Levitronix^® pumps, pneumatic pumps wear out due to friction of check valves, bellows, diaphragms, and other components. Wear can cause particle shedding that causes wafer defectivity. Furthermore, the pulsating flow of pneumatic pumps may reduce filters’ performance due to increased particle release.
Levitronix^® pump systems are designed for demanding wet cleaning applications where ultrapure and pulsation-free processing will ensure the highest yield.